Model-based opc using the meef matrix

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WebModel-based OPC using the MEEF matrix II Author (s): Junjiang Lei Le Hong George Lippincott James Word Add to cart GOOD NEWS! Your organization subscribes to the … Web11 mei 2005 · Matrix OPC has application to the following areas: (1) OPC on PSM where non-adjacent edges can have larger impact than adjacent edges, (2) dipole and other …

Nicolas B. Cobb Mentor Graphics 45 Publications 1691 …

Web15 mrt. 2016 · In this paper a novel matrix retargeting based PWOPC was developed to find optimal OPC solutions by solving constraints-based matrix and applying minimal retargeting as needed.2 Experiment results showed enhanced process window and reasonable performance. WebOPC SIMULATION MODELUSING SOCS DECOMPOSITION OF EDGE FRAGMENTS CROSS REFERENCE TO RELATED APPLICATIONS The present application is related to U.S. patent application Ser. No. 1 1/062,513, filed Jul. 26, 2004, and claims the benefit Jul 26, 2004, titled “OPC SIMULATION MODELUSING SOCS DECOMPOSITION OF EDGE … nautilus league of extraordinary gentlemen

Model-based OPC using the MEEF matrix II (2014) Lei

Webcan be classiﬁed as polygon based OPC [1] and pixel based inverse lithography [2]. ... (MEEM) [3], where MEEM is the EPE sensitivity matrix with respect to changes in mask … WebArticle “Model-based OPC using the MEEF matrix II” Detailed information of the J-GLOBAL is a service based on the concept of Linking, Expanding, and Sparking, linking … http://toc.proceedings.com/45308webtoc.pdf nautilus jg wild rift

Model-based opc using the meef matrix

Web31 mrt. 2014 · Model-based OPC using the MEEF matrix II, Proceedings of SPIE 10.1117/12.2046635 DeepDyve Model-based OPC using the MEEF matrix II Lei, … Web26 aug. 2003 · Use of the gradient of image slope with respect to change in edge position was introduced by Granik as the "contrast matrix." Whereas traditional OPC techniques focus on EPE alone (pattern fidelity), we broaden the scope of OPC to maximize slope for improved image robustness and to maximize process window.

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http://www.maojet.com.tw/files/PDF/EDA/Anchor_Detection%20of%20OPC%20Conflict%20Edges%20through%20MEEF%20Analysis.pdf Web1.A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic apparatus comprising an illumination …

WebModel-based OPC using the MEEF matrix II Lei, Junjiang ; Hong, Le ; Lippincott, George ; Word, James In the traditional OPC (Optical Proximity Correction) procedure, edges in a … Web28 aug. 2003 · Abstract We use the gradient of the image slope and gradient of the edge placement error (EPE) in order to improve both slope and EPE during OPC. The EPE gradient taken with respect to edge position is normally called MEEF or the MEEF matrix.

Web13 okt. 2011 · Model-based OPC using the MEEF matrix Nicolas B. Cobb, Y. Granik Computer Science Photomask Technology 2002 This paper covers the topic of matrix … WebModel-based SRAF insertion United States Patent 8037429 Abstract: A system for producing mask layout data retrieves target layout data defining a pattern of features, or portion thereof and an optimized mask layout pattern that includes a number of printing and non-printing features.

Web24 dec. 2002 · Model-based OPC using the MEEF matrix DOI: Authors: Nicolas B. Cobb Yuri Granik Siemens Request full-text Abstract This paper covers the topic of matrix …

Web31 mrt. 2014 · Model-based OPC using the MEEF matrix II, Proceedings of SPIE 10.1117/12.2046635 DeepDyve Model-based OPC using the MEEF matrix II Lei, Junjiang; Hong, Le; Lippincott, George; Word, James Proceedings of SPIE, Volume 9052 – Mar 31, 2014 Read Article Download PDF Share Full Text for Free (beta) 9 pages Article … mark crick statesboro gaWebModel-based OPC using the MEEF matrix. NB Cobb, Y Granik. 22nd Annual BACUS Symposium on Photomask Technology 4889, 1281-1292, 2002. 107: 2002: Correction … nautilus jr high miami beach 1955Web5 mei 2024 · OPC convergence improvement by matrix OPC solver on high MEEF contact layer Abstract: The use of dense pitch and single exposure process make 28nm contact layer known as one high MEEF (Mask Error Enhancement Factor) and low contrast layer, which also causes slow and poor OPC convergence. mark crilley pdfWeb15 mei 2011 · The quality of model-based OPC (MB-OPC) is directly determined by segment offsets after OPC processing. However, in conventional MB-OPC, the intensity … mark crider walla wallaWebA dynamic feedback controller for Optical Proximity Correction (OPC) in a random logic layout using ArF immersion Lithography is presented. The OPC convergence, … mark crilley brody\u0027s ghostWeb9052 0N Model-based OPC using the MEEF matrix II [9052-22] J. Lei, L. Hong, G. Lippincott, J. Word, Mentor Graphics Corp. (United States) iv. MULTIPLE PATTERNING AND SMO 9052 0O Immersion lithography extension to sub-10nm nodes with multiple patterning [9052-23] mark crisp citynet insurance brokers ltd markcrilley head